Kunz, R., Switkes, M., Sinta, R., Curtin, J., French, R. H., Wheland, R. H., Kao, C. H., Mawn, M. H., Lin, L. H., Wetmore, P. H., Krukonis, V. H., & Williams, K. H.(2004).Transparent fluids for 157-nm immersion lithography.Journal of Microlithography, Microfabrication, and Microsystems,3, 73.
Lyutovich, K., Oehme, M., & Ernst, F.(2004).Growth of Ultra-Thin and Highly Relaxed SiGe Layers Under In-Situ Introduction of Point Defects.European Physical Journal of Applied Physics,27, 341.
Percec, S., Getty, R., Marshall, W., , G., & French, R. H.(2003).Synthesis, structural analysis, and self-assembly of phenylene ethynylene oligomers and their sub , and substituted derivat.Journal of Polymer Science Part A: Polymer Chemistry,42, 541–550.
French, R. H.(2003).Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency.Journal of Fluorine Chemistry,122, 63–80.
Lustig, S., Boyes, E., French, R. H., Gierke, T. H., Harmer, M. H., Hietpas, P. H., Jagota, A. H., Mclean, S. H., Mitchell, G. H., Onoa, G. H., & Sams, K. H.(2003).Lithographically Cut {Single-Walled} Carbon Nanotubes: Controlling Length Distribution and Introducing {End-Group} Functionality.Nano Letters,3, 1007–1012.
Crawford, M., Farnham, W., Feiring, A., Feldman, J., French, R. H., Leffew, K. H., Petrov, V. H., Qiu, W. H., Schadt, F. H., Tran, H. H., Wheland, R. H., & Zumsteg Jr., F. H.(2003).Single layer fluropolymer resists for 157-nm lithography.Proceedings of SPIE.
Adelung, R., Kunz, R., Ernst, F., Kipp, L., & Skibowski, M.(2003).Self-Organized Structures on Flat Crystals: Nanowire Networks Formed by Metal Evaporation.Advances in Solid State Physics,43, 463–476.
Liu, R., Oba, F., Bohannan, E., Ernst, F., & Switzer, J.(2003).Epitaxial Electrodeposition of Cu2O Films onto InP(001).Applied Physics Letters,83, 1944-1946.
Liu, R., Oba, F., Bohannan, E., Ernst, F., & Switzer, J.(2003).Shape Control in Epitaxial Electrodeposition: Cu2O Nanocubes on InP(001).Chemistry of Materials,15, 4882-4885.
French, R. H.(2002).Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists..Journal of Photopolymer Science and Technology,15, 677–687.
French, R. H., Wheland, R. H., Qiu, W. H., Lemon, M. H., Blackman, G. H., Zhang, X. H., Gordon, J. H., Liberman, V. H., Grenville, A. H., Kunz, R. H., & Rothschild, M. H.(2002).157-nm pellicles: polymer design for transparency and lifetime.Proceedings of SPIE.
Grenville, A., Liberman, V., Rothschild, M., Sedlacek, J., French, R. H., Wheland, R. H., Zhang, X. H., & Gordan, J. H.(2002).Behavior of candidate organic pellicle materials under 157-nm laser irradiation.Proceedings of SPIE.
Switzer, J., Liu, R., Bohannan, E., & Ernst, F.(2002).Epitaxial Electrodeposition of a Crystalline Metal Oxide onto Single-Crystalline Silicon.The Journal of Physical Chemistry B,106, 12369–12372.
