French, R. H., Thorne, J. H., Hochstrasser, R. H., Ziegler, J. H., Tilgner, A. H., Fagan, P. H., & Miller, R. H.(2006).Electronic and Vibrational Excitations in Polysilanes and Oligomers.Molecular Crystals and Liquid Crystals,216(1),13-19.
Paumier, F., Fouquet, V., Guittet, M., Gautier-Soyer, M., French, R. H., Tan, G. H., Chiang, Y. H., Tang, L. H., Ramos, A. H., & Chung, S. H.(2006).Reflection electron energy loss spectroscopy of nanometric oxide layers and of their interfaces with a substrate.Materials Science and Engineering: A,422, 29-40.
Tan, G., & French, R. H.(2006).Optical properties, electronic structure and London dispersion interactions for nanostructured interfacial and surficial films.Materials Science and Engineering: A,422, 136–146.
French, R. H.(2006).Simulated measurement of small metal clusters by frequency-modulation non-contact atomic force microscopy.Nanotechnology,17, S121–S127.
Feiring, A., Crawford, M., Farnham, W., Feldman, J., French, R. H., Junk, C. H., Leffew, K. H., Petrov, V. H., Qiu, W. H., Schadt, F. H., Tran, H. H., & Zumsteg, F. H.(2006).New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and {Non-Fluorinated} Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm.Macromolecules,39, 3252–3261.
French, R. H., Qiu, W. H., Yang, S. H., Wheland, R. H., Lemon, M. H., Shoe, A. H., Adelman, D. H., Crawford, M. H., Tran, H. H., Feldman, J. H., McLain, S. H., & Peng, S. H.(2006).Second generation fluids for 193nm immersion lithography..
Feiring, A., Crawford, M., Farnham, W., French, R. H., Leffew, K. H., Petrov, V. H., Schadt, F. H., Tran, H. H., & Zumsteg, F. H.(2006).Bis(fluoroalcohol) Monomers and Polymers: Improved Transparency Fluoropolymer Photoresists for Semiconductor Photolithography at 157 nm.Macromolecules,39, 1443–1448.
Ernst, F., Michal, G., Kahn, H., & Heuer, A. H.(2006).Paraequilibrium Surface Alloying with Interstitial Solutes: A New Concept for Improving the Performance of Medical Devices.ASM International.
Yu, Y., Mark, J., Ernst, F., Wagner, T., & Nataraj, R.(2006).Diffusion Reactions at Al–MgAl2O4 Interfaces– and the Effect of Applied Electric Fields.Journal of Materials Science,41, 7785-7797.
Du, K., & Ernst, F.(2006).Quantitative Assessment of Nanoparticle Size Distributions from HRTEM Images.International Journal of Materials Research,97, 928-933.
Ernst, F., Michal, G., Oba, F., Liu, L., Blush, J., & Heuer, A. H.(2006).Gas-Phase Surface Alloying under “Kinetic Control,” A Novel Approach to Improving the Surface Properties of Titanium Alloys.International Journal of Materials Research,97, 597-606.
Gentil, J., Ernst, F., Michal, G., & Heuer, A. H.(2006).The Effect of Colossal Carbon Supersaturation on Stainless Steels of the Type PH13-8Mo and AL6XN.AIST - TMS.
French, R. H., Sewell, H. H., Yang, S. H., Peng, S. H., McCafferty, D. H., Qiu, W. H., Wheland, R. H., Lemon, M. H., Markoya, L. H., & Crawford, M. H.(2005).Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k[sub 1] of 0.25.Journal of Microlithography, Microfabrication, and Microsystems,4, 031103.
Peng, S., French, R. H., Qiu, W. H., Wheland, R. H., Yang, S. H., Lemon, M. H., & Crawford, M. H.(2005).Second generation fluids for 193 nm immersion lithography.Proceedings of SPIE.
Mo, S., Ching, W., & French, R. H.(2005).Electronic Structure of a Near Σ11 a-axis Tilt Grain Boundary in {α-A12O3}.Journal of the American Ceramic Society,79, 627–633.
French, R. H.(2005).{Kramers–Kronig} transform for the surface energy loss function.Journal of Electron Spectroscopy and Related Phenomena,142, 97–103.
French, R. H., Müllejans, H. H., & Jones, D. H.(2005).Optical Properties of Aluminum Oxide: Determined from Vacuum Ultraviolet and Electron {Energy-Loss} Spectroscopies.Journal of the American Ceramic Society,81, 2549–2557.
Thiele, E., & French, R. H.(2005).{Light-Scattering} Properties of Representative, Morphological Rutile Titania Particles Studied Using a {Finite-Element} Method.Journal of the American Ceramic Society,81, 469–479.
Liu, R., Kulp, E., Oba, F., Bohannan, E., Ernst, F., & Switzer, J.(2005).Epitaxial Electrodeposition of High-Aspect-Ratio Cu2O(110) Nanostructures on InP(111).Chemistry of Materials,17, 725-729.
Oba, F., Ernst, F., Yu, Y., Liu, R., Kothari, H., & Switzer, J.(2005).Epitaxial Growth of Cuprous Oxide Electrodeposited onto Semiconductor and Metal Substrates (invited “feature article”).Journal of the American Ceramic Society,88, 253-270.
