The Swagelok Center for Surface Analysis of Materials at Case Western Reserve University has three surface analysis instruments for Auger spectroscopy, X-ray photoelectron spectroscopy (also known as electron spectroscopy for chemical analysis), and time-of-flight secondary ion mass spectrometry. There are trade-offs and limitations to all equipment. The table below, provides a high-level comparison of which surface analysis technique might be useful for your scientific problem.
- PHI 680 Scanning Auger Microprobe
- PHI Versaprobe 5000 X-ray Photoelectron Spectroscopy/ESCA
- PHI TRIFT V nanoTOF Time of Flight Secondary Ion Mass Spectrometer (TOF-SIMS)
| (ToF-SIMS) | (XPS) | (AES) | |
|---|---|---|---|
| Incident Source | Ions: Ga+, C60+ | AlKa X-ray (1486.6 eV) | Electron |
| Signals Detected |
Molecular ions Atomic ions Isotope ions Secondary electrons |
Photoelectrons Auger electrons Secondary electrons |
Auger electrons Secondary electrons |
| Elements Detected | Full periodic table | Boron to Uranium | Lithium to Uranium |
| Detection Limit | ppm to ppb range | 0.1 atomic % | 0.1 atomic % |
| Probe Depth | 2-3nm | 5-10nm | 5-10nm |
| Lateral Resolution | 200nm - a few μm | 10 μm | 10nm |
| Quantitative Analysis | No | Yes | Yes |
| Sample Requirement |
UHV compatible conductors to insulators |
UHV compatible conductors to insulators |
UHV compatible conductors |
| Main Users | Excellent detection limit of elements & isotopes; Detection of atomic & molecular species (inorganic & organic); Imaging, Depth profiling | Elemental composition; Chemical state analysis; Depth profiling | Elemental composition; Small area analysis; Chemical state analysis; Imaging; Depth profiling |