Analytical Surface Analysis

Engineer Uses Auger

The Swagelok Center for Surface Analysis of Materials at Case Western Reserve University has three surface analysis instruments for Auger spectroscopy, X-ray photoelectron spectroscopy (also known as electron spectroscopy for chemical analysis), and time-of-flight secondary ion mass spectrometry. There are trade-offs and limitations to all equipment. The table below, provides a high-level comparison of which surface analysis technique might be useful for your scientific problem.

  • PHI 680 Scanning Auger Microprobe
  • PHI Versaprobe 5000 X-ray Photoelectron Spectroscopy/ESCA
  • PHI TRIFT V nanoTOF Time of Flight Secondary Ion Mass Spectrometer (TOF-SIMS)
  (ToF-SIMS) (XPS) (AES)
Incident Source Ions: Ga+, C60+  AlKa X-ray (1486.6 eV) Electron
Signals Detected

Molecular ions

Atomic ions

Isotope ions 

Secondary electrons

Photoelectrons

Auger electrons

Secondary electrons

Auger electrons

Secondary electrons

Elements Detected Full periodic table Boron to Uranium Lithium to Uranium 
Detection Limit ppm to ppb range 0.1 atomic % 0.1 atomic %
Probe Depth 2-3nm 5-10nm 5-10nm
Lateral Resolution 200nm - a few μm 10 μm  10nm
Quantitative Analysis  No Yes Yes
Sample Requirement

UHV compatible 

conductors to insulators

UHV compatible 

conductors to insulators

UHV compatible 

conductors 

Main Users Excellent detection limit of elements & isotopes; Detection of atomic & molecular species (inorganic & organic); Imaging, Depth profiling  Elemental composition; Chemical state analysis; Depth profiling  Elemental composition; Small area analysis; Chemical state analysis; Imaging; Depth profiling