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Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency

  • Read more about Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency

Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm

  • Read more about Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm

Optical Properties and London Dispersion Forces of Amorphous Silica Determined by Vacuum Ultraviolet Spectroscopy and Spectroscopic Ellipsometry

  • Read more about Optical Properties and London Dispersion Forces of Amorphous Silica Determined by Vacuum Ultraviolet Spectroscopy and Spectroscopic Ellipsometry

Transparent fluids for 157-nm immersion lithography

  • Read more about Transparent fluids for 157-nm immersion lithography

Second generation fluids for 193 nm immersion lithography

  • Read more about Second generation fluids for 193 nm immersion lithography

Fluid refractive index measurements using rough surface and prism minimum deviation techniques

  • Read more about Fluid refractive index measurements using rough surface and prism minimum deviation techniques

157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons

  • Read more about 157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons

Immersion fluid refractive indices using prism minimum deviation techniques

  • Read more about Immersion fluid refractive indices using prism minimum deviation techniques

Origins and Applications of London Dispersion Forces and Hamaker Constants in Ceramics

  • Read more about Origins and Applications of London Dispersion Forces and Hamaker Constants in Ceramics

Synthesis, structural analysis, and self-assembly of phenylene ethynylene oligomers and their sub , and substituted derivat

  • Read more about Synthesis, structural analysis, and self-assembly of phenylene ethynylene oligomers and their sub , and substituted derivat

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Case School of Engineering
Campus Location:
Nord Hall
2095 Martin Luther King Jr Dr
Rm 500
Cleveland, OH 44106

Mailing Address:
10900 Euclid Ave.
Cleveland, Ohio 44106-7148

Phone: 216.368.4436

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