Single layer fluropolymer resists for 157-nm lithography Read more about Single layer fluropolymer resists for 157-nm lithography
Lithographically Cut {Single-Walled} Carbon Nanotubes: Controlling Length Distribution and Introducing {End-Group} Functionality Read more about Lithographically Cut {Single-Walled} Carbon Nanotubes: Controlling Length Distribution and Introducing {End-Group} Functionality
Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency Read more about Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency
Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm Read more about Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm
Optical Properties and London Dispersion Forces of Amorphous Silica Determined by Vacuum Ultraviolet Spectroscopy and Spectroscopic Ellipsometry Read more about Optical Properties and London Dispersion Forces of Amorphous Silica Determined by Vacuum Ultraviolet Spectroscopy and Spectroscopic Ellipsometry
Transparent fluids for 157-nm immersion lithography Read more about Transparent fluids for 157-nm immersion lithography
Second generation fluids for 193 nm immersion lithography Read more about Second generation fluids for 193 nm immersion lithography
Fluid refractive index measurements using rough surface and prism minimum deviation techniques Read more about Fluid refractive index measurements using rough surface and prism minimum deviation techniques
157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons Read more about 157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons
Immersion fluid refractive indices using prism minimum deviation techniques Read more about Immersion fluid refractive indices using prism minimum deviation techniques
