Crawford, M., Feiring, A., Feldman, J., French, R. H., Petrov, V. H., Schadt, F. H., Smalley, R. H., & Zumsteg Jr. , F. H.(2001).157-nm imaging using thick single-layer resists.Proceedings of SPIE.
French, R. H., Wheland, R. H., Gordon, J. H., & Zhang, W. H.(2001).Optimizing polymers to increase pellicle lifetime and transmission for 157-nm lithography.Micro.
French, R. H.(2001).Valence electron energy loss study of Fe-doped {SrTiO3} and a Σ13 boundary: electronic structure and dispersion forces.Ultramicroscopy,86, 303–318.
French, R. H.(2001).Light scattering from red pigment particles: Multiple scattering in a strongly absorbing system.Journal of Applied Physics,89, 283.
French, R. H., Wheland, R. H., Jones, D. H., Hilfiker, J. H., Synowicki, R. H., Zumsteg, F. H., Feldman, J. H., & Feiring, A. H.(2000).Fluoropolymers for 157-nm lithography: optical properties from {VUV} absorbance and ellipsometry measurements.Proceedings of SPIE Vol. 4000,4000
French, R. H., & Müllejans, H. H.(2000).Insights Into the Electronic Structure of Ceramics Through Quantitative Analysis of Valence Electron Energy-loss Spectroscopy {(VEELS)}.Microscopy and Microanalysis,6, 297-306.
French, R. H., Crawford, M. H., Feiring, A. H., Feldman, J. H., Periyasamy, M. H., Schadt, F. H., Smalley, R. H., Zumsteg, F. H., Kunz, R. H., Rao, V. H., Lao, L. H., & Holl, S. H.(2000).New materials for 157-nm photoresists: characterization and properties.Proceedings of SPIE,3999
French, R. H., Francis Carcia, P. H., Hughes, G. H., Torardi, C. H., Reynolds, G. H., & Dieu, L. H.(1999).Thin Films for Phase-shift Masks.Vaccum and Thin Film.
French, R. H., Francis Carcia, P. H., Reynolds, G. H., Hughes, G. H., Torardi, C. H., Jones, D. H., & Dieu, L. H.(1999).Optical superlattices as phase-shift masks for microlithography.Proceedings of SPIE,3790
French, R. H., Reynolds, G. H., Francis Carcia, P. H., Torardi, C. H., Hughes, G. H., & Jones, D. H.(1998).{TiSi-nitride} attenuating phase-shift photomask for 193 nm lithography.SPIE,3546
French, R. H., Müllejans, H. H., & Jones, D. H.(1998).Dispersion forces and Hamaker constants for intergranular films in silicon nitride from spatially resolved-valence electron energy loss spectrum imaging.Acta Materialia,46(7),2271-2287.
French, R. H., Johnson, R. H., & Thiele, E. H.(1997).Light-scattering efficiency of white pigments: an analysis of model core - shell pigments vs. optimized rutile {TiO2}.{TAPPI} Journal,80, 233-239.
French, R. H., & Thiele, E. H.(1997).Computational Modeling of {TiO2} Particle Optics Using a Finite Element Method.Proceedings of the Paint Research Association.
French, R. H., & Müllejans, H. H.(1997).Improved Measurement and Analysis of Series of Valence Electron Energy Loss Spectra and the Local Electronic Structure.Proceedings of the Microscopy Society of America.
