Publications

Tuesday, December 14, 2004

Fluid refractive index measurements using rough surface and prism minimum deviation techniques

Synowicki, R., Pribil, G., Cooney, G., Herzinger, C., Green, S., French, R. H., Yang, S. H., Burnett, J. H., & Kaplan, S. H. (2004). Fluid refractive index measurements using rough surface and prism minimum deviation techniques. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 22 , 3450.

Thursday, November 11, 2004

Local Optical Properties, Electron Densities, and London Dispersion Energies of Atomically Structured Grain Boundaries

Van Benthem, K., Tan, G., Denoyer, L., French, R. H., & Ruhle, M. H. (2004). Local Optical Properties, Electron Densities, and London Dispersion Energies of Atomically Structured Grain Boundaries. Physical Review Letters, 93

Sunday, August 1, 2004

Immersion fluids for lithography: refractive index measurement using prism minimum deviation techniques

Synowkicki, R., & Pribil, G. (2004). Immersion fluids for lithography: refractive index measurement using prism minimum deviation techniques. Semconductor Fabtech.

Friday, May 28, 2004

157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons

Lee, K., Jockusch, S., Turro, N., French, R. H., Wheland, R. H., Lemon, M. H., Braun, A. H., Widerschpan, T. H., & Zimmerman, P. H. (2004). 157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons. Proceedings of SPIE.

Monday, May 24, 2004

Immersion fluid refractive indices using prism minimum deviation techniques

French, R. H., Yang, S. H., Lemon, M. H., Synowicki, R. H., Pribil, G. H., Cooney, G. H., Herzinger, C. H., Green, S. H., Burnett, J. H., & Kaplan, S. H. (2004). Immersion fluid refractive indices using prism minimum deviation techniques. Proceedings of SPIE.

Thursday, January 1, 2004

Transparent fluids for 157-nm immersion lithography

Kunz, R., Switkes, M., Sinta, R., Curtin, J., French, R. H., Wheland, R. H., Kao, C. H., Mawn, M. H., Lin, L. H., Wetmore, P. H., Krukonis, V. H., & Williams, K. H. (2004). Transparent fluids for 157-nm immersion lithography. Journal of Microlithography, Microfabrication, and Microsystems, 3 , 73.

Tuesday, December 16, 2003

Synthesis, structural analysis, and self-assembly of phenylene ethynylene oligomers and their sub , and substituted derivat

Percec, S., Getty, R., Marshall, W., , G., & French, R. H. (2003). Synthesis, structural analysis, and self-assembly of phenylene ethynylene oligomers and their sub , and substituted derivat. Journal of Polymer Science Part A: Polymer Chemistry, 42 , 541–550.

Friday, October 31, 2003

Optical properties and electronic structure of oxidized and reduced single-crystal strontium titanate

Frye, R. (2003). Optical properties and electronic structure of oxidized and reduced single-crystal strontium titanate. , 94 , 226–232.

Friday, August 1, 2003

Novel Process Methodology for Uniformly Cutting Nanotubes

Lustig, S., & Boyes, E. (2003). Novel Process Methodology for Uniformly Cutting Nanotubes. MRS Proceedings.

Tuesday, July 1, 2003

Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm

French, R. H. (2003). Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm. Journal of Fluorine Chemistry, 122 , 11–16.

Tuesday, July 1, 2003

Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency

French, R. H. (2003). Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency. Journal of Fluorine Chemistry, 122 , 63–80.

Wednesday, June 25, 2003

Lithographically Cut {Single-Walled} Carbon Nanotubes: Controlling Length Distribution and Introducing {End-Group} Functionality

Lustig, S., Boyes, E., French, R. H., Gierke, T. H., Harmer, M. H., Hietpas, P. H., Jagota, A. H., Mclean, S. H., Mitchell, G. H., Onoa, G. H., & Sams, K. H. (2003). Lithographically Cut {Single-Walled} Carbon Nanotubes: Controlling Length Distribution and Introducing {End-Group} Functionality. Nano Letters, 3 , 1007–1012.

Thursday, June 12, 2003

Single layer fluropolymer resists for 157-nm lithography

Crawford, M., Farnham, W., Feiring, A., Feldman, J., French, R. H., Leffew, K. H., Petrov, V. H., Qiu, W. H., Schadt, F. H., Tran, H. H., Wheland, R. H., & Zumsteg Jr., F. H. (2003). Single layer fluropolymer resists for 157-nm lithography. Proceedings of SPIE.

Thursday, October 31, 2002

A Novel Process Methodology for Cutting Uniform Nanostructures

Lustig, S., & Boyes, E. (2002). A Novel Process Methodology for Cutting Uniform Nanostructures. AICHE 2002 Proceedings: Materials Processing in Nanoelectronics.

Thursday, August 1, 2002

Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists.

French, R. H. (2002). Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists.. Journal of Photopolymer Science and Technology, 15 , 677–687.

Tuesday, July 30, 2002

Behavior of candidate organic pellicle materials under 157-nm laser irradiation

Grenville, A., Liberman, V., Rothschild, M., Sedlacek, J., French, R. H., Wheland, R. H., Zhang, X. H., & Gordan, J. H. (2002). Behavior of candidate organic pellicle materials under 157-nm laser irradiation. Proceedings of SPIE.