Tuesday, December 14, 2004 Fluid refractive index measurements using rough surface and prism minimum deviation techniques Synowicki, R., Pribil, G., Cooney, G., Herzinger, C., Green, S., French, R. H., ... Kaplan, S. (2004). Fluid refractive index measurements using rough surface and prism minimum deviation techniques. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 22 (), 3450. DOI: 10.1116/1.1813455 Thursday, November 11, 2004 Local Optical Properties, Electron Densities, and London Dispersion Energies of Atomically Structured Grain Boundaries Van Benthem, K., Tan, G., Denoyer, L., French, R. H., & Ruhle, M. (2004). Local Optical Properties, Electron Densities, and London Dispersion Energies of Atomically Structured Grain Boundaries. Physical Review Letters, 93 (). DOI: 10.1103/PhysRevLett.93.227201 Sunday, August 1, 2004 Immersion fluids for lithography: refractive index measurement using prism minimum deviation techniques Synowkicki, R., & Pribil, G. (2004). Immersion fluids for lithography: refractive index measurement using prism minimum deviation techniques. Semconductor Fabtech, (22), 55–58. Friday, May 28, 2004 157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons Lee, K., Jockusch, S., Turro, N., French, R. H., Wheland, R., Lemon, M., ... Zimmerman, P. (2004). 157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons. Proceedings of SPIE, (). DOI: 10.1117/12.534381 Monday, May 24, 2004 Immersion fluid refractive indices using prism minimum deviation techniques French, R. H., Yang, S., Lemon, M., Synowicki, R., Pribil, G., Cooney, G., ... Kaplan, S. (2004). Immersion fluid refractive indices using prism minimum deviation techniques. Proceedings of SPIE, (). DOI: 10.1117/12.537727 Thursday, January 1, 2004 Transparent fluids for 157-nm immersion lithography Kunz, R., Switkes, M., Sinta, R., Curtin, J., French, R. H., Wheland, R., ... Williams, K. (2004). Transparent fluids for 157-nm immersion lithography. Journal of Microlithography, Microfabrication, and Microsystems, 3 (), 73. DOI: 10.1117/1.1637366 Tuesday, December 16, 2003 Synthesis, structural analysis, and self-assembly of phenylene ethynylene oligomers and their sub , and substituted derivat Percec, S., Getty, R., Marshall, W., , G., & French, R. H. (2003). Synthesis, structural analysis, and self-assembly of phenylene ethynylene oligomers and their sub , and substituted derivat. Journal of Polymer Science Part A: Polymer Chemistry, 42 (), 541–550. DOI: 10.1002/pola.10949 Friday, October 31, 2003 Optical properties and electronic structure of oxidized and reduced single-crystal strontium titanate Frye, R. (2003). Optical properties and electronic structure of oxidized and reduced single-crystal strontium titanate. , 94 (), 226–232. Friday, August 1, 2003 Novel Process Methodology for Uniformly Cutting Nanotubes Lustig, S., & Boyes, E. (2003). Novel Process Methodology for Uniformly Cutting Nanotubes. MRS Proceedings, (). Tuesday, July 1, 2003 Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm French, R. H. (2003). Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm. Journal of Fluorine Chemistry, 122 (), 11–16. DOI: 10.1016/S0022-1139(03)00075-7 Tuesday, July 1, 2003 Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency French, R. H. (2003). Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency. Journal of Fluorine Chemistry, 122 (), 63–80. DOI: 10.1016/S0022-1139(03)00081-2 Wednesday, June 25, 2003 Lithographically Cut {Single-Walled} Carbon Nanotubes: Controlling Length Distribution and Introducing {End-Group} Functionality Lustig, S., Boyes, E., French, R. H., Gierke, T., Harmer, M., Hietpas, P., ... Sams, K. (2003). Lithographically Cut {Single-Walled} Carbon Nanotubes: Controlling Length Distribution and Introducing {End-Group} Functionality. Nano Letters, 3 (), 1007–1012. DOI: 10.1021/nl034219y Thursday, June 12, 2003 Single layer fluropolymer resists for 157-nm lithography Crawford, M., Farnham, W., Feiring, A., Feldman, J., French, R. H., Leffew, K., ... Zumsteg Jr., F. (2003). Single layer fluropolymer resists for 157-nm lithography. Proceedings of SPIE, (). DOI: 10.1117/12.485206 Thursday, October 31, 2002 A Novel Process Methodology for Cutting Uniform Nanostructures Lustig, S., & Boyes, E. (2002). A Novel Process Methodology for Cutting Uniform Nanostructures. AICHE 2002 Proceedings: Materials Processing in Nanoelectronics, (). Thursday, August 1, 2002 Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists. French, R. H. (2002). Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists.. Journal of Photopolymer Science and Technology, 15 (), 677–687. DOI: 10.2494/photopolymer.15.677 Tuesday, July 30, 2002 Behavior of candidate organic pellicle materials under 157-nm laser irradiation Grenville, A., Liberman, V., Rothschild, M., Sedlacek, J., French, R. H., Wheland, R., ... Gordan, J. (2002). Behavior of candidate organic pellicle materials under 157-nm laser irradiation. Proceedings of SPIE, (). DOI: 10.1117/12.474604 Tuesday, July 30, 2002 157-nm pellicles: polymer design for transparency and lifetime French, R. H., Wheland, R., Qiu, W., Lemon, M., Blackman, G., Zhang, X., ... Rothschild, M. (2002). 157-nm pellicles: polymer design for transparency and lifetime. Proceedings of SPIE, (). DOI: 10.1117/12.474605 Tuesday, December 25, 2001 Quantitative analysis of valence electron energy-loss spectra of aluminium nitride French, R. H. (2001). Quantitative analysis of valence electron energy-loss spectra of aluminium nitride. Journal of Microscopy, 191 (3), 286-296. DOI: 10.1046/j.1365-2818.1998.00370.x Saturday, December 15, 2001 Bulk electronic structure of {SrTiO[sub} 3]: Experiment and theory French, R. H. (2001). Bulk electronic structure of {SrTiO[sub} 3]: Experiment and theory. Journal of Applied Physics, 90 (), 6156. DOI: 10.1063/1.1415766 Tuesday, September 4, 2001 Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography French, R. H., Gordon, J., Jones, D., Wheland, R., Zhang, X., Zumsteg, F., ... Qiu, W. (2001). Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography. Proc. SPIE 4346, (). DOI: 10.1117/12.435710 Pages« first ‹ previous 1 2 3 4 5 6 7 8 next › last »
Tuesday, December 14, 2004 Fluid refractive index measurements using rough surface and prism minimum deviation techniques Synowicki, R., Pribil, G., Cooney, G., Herzinger, C., Green, S., French, R. H., ... Kaplan, S. (2004). Fluid refractive index measurements using rough surface and prism minimum deviation techniques. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 22 (), 3450. DOI: 10.1116/1.1813455
Thursday, November 11, 2004 Local Optical Properties, Electron Densities, and London Dispersion Energies of Atomically Structured Grain Boundaries Van Benthem, K., Tan, G., Denoyer, L., French, R. H., & Ruhle, M. (2004). Local Optical Properties, Electron Densities, and London Dispersion Energies of Atomically Structured Grain Boundaries. Physical Review Letters, 93 (). DOI: 10.1103/PhysRevLett.93.227201
Sunday, August 1, 2004 Immersion fluids for lithography: refractive index measurement using prism minimum deviation techniques Synowkicki, R., & Pribil, G. (2004). Immersion fluids for lithography: refractive index measurement using prism minimum deviation techniques. Semconductor Fabtech, (22), 55–58.
Friday, May 28, 2004 157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons Lee, K., Jockusch, S., Turro, N., French, R. H., Wheland, R., Lemon, M., ... Zimmerman, P. (2004). 157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons. Proceedings of SPIE, (). DOI: 10.1117/12.534381
Monday, May 24, 2004 Immersion fluid refractive indices using prism minimum deviation techniques French, R. H., Yang, S., Lemon, M., Synowicki, R., Pribil, G., Cooney, G., ... Kaplan, S. (2004). Immersion fluid refractive indices using prism minimum deviation techniques. Proceedings of SPIE, (). DOI: 10.1117/12.537727
Thursday, January 1, 2004 Transparent fluids for 157-nm immersion lithography Kunz, R., Switkes, M., Sinta, R., Curtin, J., French, R. H., Wheland, R., ... Williams, K. (2004). Transparent fluids for 157-nm immersion lithography. Journal of Microlithography, Microfabrication, and Microsystems, 3 (), 73. DOI: 10.1117/1.1637366
Tuesday, December 16, 2003 Synthesis, structural analysis, and self-assembly of phenylene ethynylene oligomers and their sub , and substituted derivat Percec, S., Getty, R., Marshall, W., , G., & French, R. H. (2003). Synthesis, structural analysis, and self-assembly of phenylene ethynylene oligomers and their sub , and substituted derivat. Journal of Polymer Science Part A: Polymer Chemistry, 42 (), 541–550. DOI: 10.1002/pola.10949
Friday, October 31, 2003 Optical properties and electronic structure of oxidized and reduced single-crystal strontium titanate Frye, R. (2003). Optical properties and electronic structure of oxidized and reduced single-crystal strontium titanate. , 94 (), 226–232.
Friday, August 1, 2003 Novel Process Methodology for Uniformly Cutting Nanotubes Lustig, S., & Boyes, E. (2003). Novel Process Methodology for Uniformly Cutting Nanotubes. MRS Proceedings, ().
Tuesday, July 1, 2003 Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm French, R. H. (2003). Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm. Journal of Fluorine Chemistry, 122 (), 11–16. DOI: 10.1016/S0022-1139(03)00075-7
Tuesday, July 1, 2003 Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency French, R. H. (2003). Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency. Journal of Fluorine Chemistry, 122 (), 63–80. DOI: 10.1016/S0022-1139(03)00081-2
Wednesday, June 25, 2003 Lithographically Cut {Single-Walled} Carbon Nanotubes: Controlling Length Distribution and Introducing {End-Group} Functionality Lustig, S., Boyes, E., French, R. H., Gierke, T., Harmer, M., Hietpas, P., ... Sams, K. (2003). Lithographically Cut {Single-Walled} Carbon Nanotubes: Controlling Length Distribution and Introducing {End-Group} Functionality. Nano Letters, 3 (), 1007–1012. DOI: 10.1021/nl034219y
Thursday, June 12, 2003 Single layer fluropolymer resists for 157-nm lithography Crawford, M., Farnham, W., Feiring, A., Feldman, J., French, R. H., Leffew, K., ... Zumsteg Jr., F. (2003). Single layer fluropolymer resists for 157-nm lithography. Proceedings of SPIE, (). DOI: 10.1117/12.485206
Thursday, October 31, 2002 A Novel Process Methodology for Cutting Uniform Nanostructures Lustig, S., & Boyes, E. (2002). A Novel Process Methodology for Cutting Uniform Nanostructures. AICHE 2002 Proceedings: Materials Processing in Nanoelectronics, ().
Thursday, August 1, 2002 Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists. French, R. H. (2002). Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists.. Journal of Photopolymer Science and Technology, 15 (), 677–687. DOI: 10.2494/photopolymer.15.677
Tuesday, July 30, 2002 Behavior of candidate organic pellicle materials under 157-nm laser irradiation Grenville, A., Liberman, V., Rothschild, M., Sedlacek, J., French, R. H., Wheland, R., ... Gordan, J. (2002). Behavior of candidate organic pellicle materials under 157-nm laser irradiation. Proceedings of SPIE, (). DOI: 10.1117/12.474604
Tuesday, July 30, 2002 157-nm pellicles: polymer design for transparency and lifetime French, R. H., Wheland, R., Qiu, W., Lemon, M., Blackman, G., Zhang, X., ... Rothschild, M. (2002). 157-nm pellicles: polymer design for transparency and lifetime. Proceedings of SPIE, (). DOI: 10.1117/12.474605
Tuesday, December 25, 2001 Quantitative analysis of valence electron energy-loss spectra of aluminium nitride French, R. H. (2001). Quantitative analysis of valence electron energy-loss spectra of aluminium nitride. Journal of Microscopy, 191 (3), 286-296. DOI: 10.1046/j.1365-2818.1998.00370.x
Saturday, December 15, 2001 Bulk electronic structure of {SrTiO[sub} 3]: Experiment and theory French, R. H. (2001). Bulk electronic structure of {SrTiO[sub} 3]: Experiment and theory. Journal of Applied Physics, 90 (), 6156. DOI: 10.1063/1.1415766
Tuesday, September 4, 2001 Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography French, R. H., Gordon, J., Jones, D., Wheland, R., Zhang, X., Zumsteg, F., ... Qiu, W. (2001). Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography. Proc. SPIE 4346, (). DOI: 10.1117/12.435710