New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and {Non-Fluorinated} Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm Read more about New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and {Non-Fluorinated} Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm
New materials for 157-nm photoresists: characterization and properties Read more about New materials for 157-nm photoresists: characterization and properties
Fluoropolymers for 157-nm lithography: optical properties from {VUV} absorbance and ellipsometry measurements Read more about Fluoropolymers for 157-nm lithography: optical properties from {VUV} absorbance and ellipsometry measurements
Multiple scattering from rutile {TiO2} particles Read more about Multiple scattering from rutile {TiO2} particles
Orientation dependence in near-field scattering from {TiO2} particles Read more about Orientation dependence in near-field scattering from {TiO2} particles
Near-field scattering from red pigment particles: Absorption and spectral dependence Read more about Near-field scattering from red pigment particles: Absorption and spectral dependence
Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography Read more about Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography
Graded interface models for more accurate determination of van der {Waals–London} dispersion interactions across grain boundaries Read more about Graded interface models for more accurate determination of van der {Waals–London} dispersion interactions across grain boundaries
Optical Properties and van der Waals–London Dispersion Interactions of Polystyrene Determined by Vacuum Ultraviolet Spectroscopy and Spectroscopic Ellipsometry Read more about Optical Properties and van der Waals–London Dispersion Interactions of Polystyrene Determined by Vacuum Ultraviolet Spectroscopy and Spectroscopic Ellipsometry
High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches Read more about High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches
