Feiring, A., Crawford, M., Farnham, W., Feldman, J., French, R. H., Junk, C. H., Leffew, K. H., Petrov, V. H., Qiu, W. H., Schadt, F. H., Tran, H. H., & Zumsteg, F. H.(2006).New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and {Non-Fluorinated} Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm.Macromolecules,39, 3252–3261.
French, R. H., Qiu, W. H., Yang, S. H., Wheland, R. H., Lemon, M. H., Shoe, A. H., Adelman, D. H., Crawford, M. H., Tran, H. H., Feldman, J. H., McLain, S. H., & Peng, S. H.(2006).Second generation fluids for 193nm immersion lithography..
Feiring, A., Crawford, M., Farnham, W., French, R. H., Leffew, K. H., Petrov, V. H., Schadt, F. H., Tran, H. H., & Zumsteg, F. H.(2006).Bis(fluoroalcohol) Monomers and Polymers: Improved Transparency Fluoropolymer Photoresists for Semiconductor Photolithography at 157 nm.Macromolecules,39, 1443–1448.
French, R. H., Sewell, H. H., Yang, S. H., Peng, S. H., McCafferty, D. H., Qiu, W. H., Wheland, R. H., Lemon, M. H., Markoya, L. H., & Crawford, M. H.(2005).Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k[sub 1] of 0.25.Journal of Microlithography, Microfabrication, and Microsystems,4, 031103.
Peng, S., French, R. H., Qiu, W. H., Wheland, R. H., Yang, S. H., Lemon, M. H., & Crawford, M. H.(2005).Second generation fluids for 193 nm immersion lithography.Proceedings of SPIE.
Mo, S., Ching, W., & French, R. H.(2005).Electronic Structure of a Near Σ11 a-axis Tilt Grain Boundary in {α-A12O3}.Journal of the American Ceramic Society,79, 627–633.
French, R. H.(2005).{Kramers–Kronig} transform for the surface energy loss function.Journal of Electron Spectroscopy and Related Phenomena,142, 97–103.
French, R. H., Müllejans, H. H., & Jones, D. H.(2005).Optical Properties of Aluminum Oxide: Determined from Vacuum Ultraviolet and Electron {Energy-Loss} Spectroscopies.Journal of the American Ceramic Society,81, 2549–2557.
Thiele, E., & French, R. H.(2005).{Light-Scattering} Properties of Representative, Morphological Rutile Titania Particles Studied Using a {Finite-Element} Method.Journal of the American Ceramic Society,81, 469–479.
French, R. H.(2004).Origins and Applications of London Dispersion Forces and Hamaker Constants in Ceramics.Journal of the American Ceramic Society,83, 2117–2146.
Tan, G., Lemon, M., & French, R. H.(2004).Optical Properties and London Dispersion Forces of Amorphous Silica Determined by Vacuum Ultraviolet Spectroscopy and Spectroscopic Ellipsometry.Journal of the American Ceramic Society,86, 1885–1892.
Smith, J., French, R. H., Duscher, G. H., & Bonnell, D. H.(2004).Consequence of {Nanometer-Scale} Property Variations to Macroscopic Properties of {CrOCN} Thin Films.Journal of the American Ceramic Society,84, 2873–2881.
Synowicki, R., Pribil, G., Cooney, G., Herzinger, C., Green, S., French, R. H., Yang, S. H., Burnett, J. H., & Kaplan, S. H.(2004).Fluid refractive index measurements using rough surface and prism minimum deviation techniques.Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures,22, 3450.
Van Benthem, K., Tan, G., Denoyer, L., French, R. H., & Ruhle, M. H.(2004).Local Optical Properties, Electron Densities, and London Dispersion Energies of Atomically Structured Grain Boundaries.Physical Review Letters,93
Lee, K., Jockusch, S., Turro, N., French, R. H., Wheland, R. H., Lemon, M. H., Braun, A. H., Widerschpan, T. H., & Zimmerman, P. H.(2004).157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons.Proceedings of SPIE.
French, R. H., Yang, S. H., Lemon, M. H., Synowicki, R. H., Pribil, G. H., Cooney, G. H., Herzinger, C. H., Green, S. H., Burnett, J. H., & Kaplan, S. H.(2004).Immersion fluid refractive indices using prism minimum deviation techniques.Proceedings of SPIE.
Kunz, R., Switkes, M., Sinta, R., Curtin, J., French, R. H., Wheland, R. H., Kao, C. H., Mawn, M. H., Lin, L. H., Wetmore, P. H., Krukonis, V. H., & Williams, K. H.(2004).Transparent fluids for 157-nm immersion lithography.Journal of Microlithography, Microfabrication, and Microsystems,3, 73.
Percec, S., Getty, R., Marshall, W., , G., & French, R. H.(2003).Synthesis, structural analysis, and self-assembly of phenylene ethynylene oligomers and their sub , and substituted derivat.Journal of Polymer Science Part A: Polymer Chemistry,42, 541–550.
French, R. H.(2003).Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency.Journal of Fluorine Chemistry,122, 63–80.
Lustig, S., Boyes, E., French, R. H., Gierke, T. H., Harmer, M. H., Hietpas, P. H., Jagota, A. H., Mclean, S. H., Mitchell, G. H., Onoa, G. H., & Sams, K. H.(2003).Lithographically Cut {Single-Walled} Carbon Nanotubes: Controlling Length Distribution and Introducing {End-Group} Functionality.Nano Letters,3, 1007–1012.
Crawford, M., Farnham, W., Feiring, A., Feldman, J., French, R. H., Leffew, K. H., Petrov, V. H., Qiu, W. H., Schadt, F. H., Tran, H. H., Wheland, R. H., & Zumsteg Jr., F. H.(2003).Single layer fluropolymer resists for 157-nm lithography.Proceedings of SPIE.
French, R. H.(2002).Fluoropolymers for 157 nm Lithography: Performance of Single Layer Resists..Journal of Photopolymer Science and Technology,15, 677–687.
Grenville, A., Liberman, V., Rothschild, M., Sedlacek, J., French, R. H., Wheland, R. H., Zhang, X. H., & Gordan, J. H.(2002).Behavior of candidate organic pellicle materials under 157-nm laser irradiation.Proceedings of SPIE.
