Publications
Monday, November 13, 2006
Benthem, K., Tan, G., French, R. H. , Denoyer, L., Podgornik, R., & Parsegian, V.
(2006).
Graded interface models for more accurate determination of van der {Waals–London} dispersion interactions across grain boundaries.
Physical Review B,
74
().
DOI:
10.1103/PhysRevB.74.205110
Tuesday, October 17, 2006
French, R. H.
(2006).
Origins and Applications of London Dispersion Interactions in Polymers and Other Materials: Electronic Structure, Optical Properties and Chemistry.
Polymer Division, Royal Australian Chemical Institute,
().
Sunday, September 24, 2006
French, R. H. , Thorne, J., Hochstrasser, R., Ziegler, J., Tilgner, A., Fagan, P., ... Miller, R.
(2006).
Electronic and Vibrational Excitations in Polysilanes and Oligomers.
Molecular Crystals and Liquid Crystals,
216
(1),
13-19.
DOI:
10.1080/10587259208028742
Wednesday, April 26, 2006
Paumier, F., Fouquet, V., Guittet, M., Gautier-Soyer, M., French, R. H. , Tan, G., ... Chung, S.
(2006).
Reflection electron energy loss spectroscopy of nanometric oxide layers and of their interfaces with a substrate.
Materials Science and Engineering: A,
422
(),
29-40.
DOI:
10.1016/j.msea.2006.01.005
Tuesday, March 28, 2006
Feiring, A., Crawford, M., Farnham, W., Feldman, J., French, R. H. , Junk, C., ... Zumsteg, F.
(2006).
New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and {Non-Fluorinated} Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm.
Macromolecules,
39
(),
3252–3261.
DOI:
10.1021/ma060070b
Wednesday, March 15, 2006
French, R. H. , Qiu, W., Yang, S., Wheland, R., Lemon, M., Shoe, A., ... Peng, S.
(2006).
Second generation fluids for 193nm immersion lithography.
,
().
DOI:
10.1117/12.656626
Monday, January 16, 2006
Feiring, A., Crawford, M., Farnham, W., French, R. H. , Leffew, K., Petrov, V., ... Zumsteg, F.
(2006).
Bis(fluoroalcohol) Monomers and Polymers: Improved Transparency Fluoropolymer Photoresists for Semiconductor Photolithography at 157 nm.
Macromolecules,
39
(),
1443–1448.
DOI:
10.1021/ma051984l
Wednesday, November 16, 2005
Friday, July 1, 2005
French, R. H. , Sewell, H., Yang, S., Peng, S., McCafferty, D., Qiu, W., ... Crawford, M.
(2005).
Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k[sub 1] of 0.25.
Journal of Microlithography, Microfabrication, and Microsystems,
4
(),
031103.
DOI:
10.1117/1.2039953
Thursday, May 12, 2005
Peng, S., French, R. H. , Qiu, W., Wheland, R., Yang, S., Lemon, M., ... Crawford, M.
(2005).
Second generation fluids for 193 nm immersion lithography.
Proceedings of SPIE,
().
DOI:
10.1117/12.606448
Thursday, February 17, 2005
Monday, December 20, 2004
Monday, December 20, 2004
Monday, December 20, 2004
Pages