2008,"Processes and Devices Using Polycyclic Fluoroalkanes in Vacuum and Deep Ultraviolet Applications"7,435,528,Roger French, Robert Wheland, & Weiming Qiu.
2002,"Use of Partially Fluorinated Polymers in Applications Requiring Transparency in the Ultraviolet and Vacuum Ultraviolet"7,438,995,Roger French, Robert Wheland, & Weiming Qiu.
Publications
French, R. H., Liberman, V. H., Tran, H. H., Feldman, J. H., Adelman, D. H., Wheland, R. H., Qiu, W. H., McLain, S. H., Kaku, M. H., Mocella, M. H., Nagao, K. H., & Person, N. H.(2007).High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches..
French, R. H., Winey, K. H., Yang, S. H., & Qiu, W. H.(2007 ).Optical Properties and van der Waals–London Dispersion Interactions of Polystyrene Determined by Vacuum Ultraviolet Spectroscopy and Spectroscopic Ellipsometry.Australian Journal of Chemistry,60(251).
Feiring, A., Crawford, M., Farnham, W., Feldman, J., French, R. H., Junk, C. H., Leffew, K. H., Petrov, V. H., Qiu, W. H., Schadt, F. H., Tran, H. H., & Zumsteg, F. H.(2006).New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and {Non-Fluorinated} Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm.Macromolecules,39, 3252–3261.
French, R. H., Qiu, W. H., Yang, S. H., Wheland, R. H., Lemon, M. H., Shoe, A. H., Adelman, D. H., Crawford, M. H., Tran, H. H., Feldman, J. H., McLain, S. H., & Peng, S. H.(2006).Second generation fluids for 193nm immersion lithography..
French, R. H., Sewell, H. H., Yang, S. H., Peng, S. H., McCafferty, D. H., Qiu, W. H., Wheland, R. H., Lemon, M. H., Markoya, L. H., & Crawford, M. H.(2005).Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k[sub 1] of 0.25.Journal of Microlithography, Microfabrication, and Microsystems,4, 031103.
Peng, S., French, R. H., Qiu, W. H., Wheland, R. H., Yang, S. H., Lemon, M. H., & Crawford, M. H.(2005).Second generation fluids for 193 nm immersion lithography.Proceedings of SPIE.
Crawford, M., Farnham, W., Feiring, A., Feldman, J., French, R. H., Leffew, K. H., Petrov, V. H., Qiu, W. H., Schadt, F. H., Tran, H. H., Wheland, R. H., & Zumsteg Jr., F. H.(2003).Single layer fluropolymer resists for 157-nm lithography.Proceedings of SPIE.
French, R. H., Wheland, R. H., Qiu, W. H., Lemon, M. H., Blackman, G. H., Zhang, X. H., Gordon, J. H., Liberman, V. H., Grenville, A. H., Kunz, R. H., & Rothschild, M. H.(2002).157-nm pellicles: polymer design for transparency and lifetime.Proceedings of SPIE.
French, R. H., Gordon, J. H., Jones, D. H., Wheland, R. H., Zhang, X. H., Zumsteg, F. H., Sharp, K. H., & Qiu, W. H.(2001).Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography.Proc. SPIE 4346.
