2009,"Packages for Alkanes Having {Ultra-High} Transparency at 193 nm"7,493,743,Robert Wheland, Curtis Fincher, Roger French, Sheng Peng, & Weiming Weiming.
Publications
French, R. H., Qiu, W. H., Yang, S. H., Wheland, R. H., Lemon, M. H., Shoe, A. H., Adelman, D. H., Crawford, M. H., Tran, H. H., Feldman, J. H., McLain, S. H., & Peng, S. H.(2006).Second generation fluids for 193nm immersion lithography..
French, R. H., Sewell, H. H., Yang, S. H., Peng, S. H., McCafferty, D. H., Qiu, W. H., Wheland, R. H., Lemon, M. H., Markoya, L. H., & Crawford, M. H.(2005).Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k[sub 1] of 0.25.Journal of Microlithography, Microfabrication, and Microsystems,4, 031103.
Peng, S., French, R. H., Qiu, W. H., Wheland, R. H., Yang, S. H., Lemon, M. H., & Crawford, M. H.(2005).Second generation fluids for 193 nm immersion lithography.Proceedings of SPIE.
