2009,"Packages for Alkanes Having {Ultra-High} Transparency at 193 nm"7,493,743,Robert Wheland, Curtis Fincher, Roger French, Sheng Peng, & Weiming Weiming.
2008,"Processes and Devices Using Polycyclic Fluoroalkanes in Vacuum and Deep Ultraviolet Applications"7,435,528,Roger French, Robert Wheland, & Weiming Qiu.
2007,""7,300,743,Roger French, David Jones, & Robert Wheland.
2002,"Use of Partially Fluorinated Polymers in Applications Requiring Transparency in the Ultraviolet and Vacuum Ultraviolet"7,438,995,Roger French, Robert Wheland, & Weiming Qiu.
Publications
French, R. H., Liberman, V. H., Tran, H. H., Feldman, J. H., Adelman, D. H., Wheland, R. H., Qiu, W. H., McLain, S. H., Kaku, M. H., Mocella, M. H., Nagao, K. H., & Person, N. H.(2007).High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches..
French, R. H., Qiu, W. H., Yang, S. H., Wheland, R. H., Lemon, M. H., Shoe, A. H., Adelman, D. H., Crawford, M. H., Tran, H. H., Feldman, J. H., McLain, S. H., & Peng, S. H.(2006).Second generation fluids for 193nm immersion lithography..
Peng, S., French, R. H., Qiu, W. H., Wheland, R. H., Yang, S. H., Lemon, M. H., & Crawford, M. H.(2005).Second generation fluids for 193 nm immersion lithography.Proceedings of SPIE.
Lee, K., Jockusch, S., Turro, N., French, R. H., Wheland, R. H., Lemon, M. H., Braun, A. H., Widerschpan, T. H., & Zimmerman, P. H.(2004).157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons.Proceedings of SPIE.
Kunz, R., Switkes, M., Sinta, R., Curtin, J., French, R. H., Wheland, R. H., Kao, C. H., Mawn, M. H., Lin, L. H., Wetmore, P. H., Krukonis, V. H., & Williams, K. H.(2004).Transparent fluids for 157-nm immersion lithography.Journal of Microlithography, Microfabrication, and Microsystems,3, 73.
Crawford, M., Farnham, W., Feiring, A., Feldman, J., French, R. H., Leffew, K. H., Petrov, V. H., Qiu, W. H., Schadt, F. H., Tran, H. H., Wheland, R. H., & Zumsteg Jr., F. H.(2003).Single layer fluropolymer resists for 157-nm lithography.Proceedings of SPIE.
Grenville, A., Liberman, V., Rothschild, M., Sedlacek, J., French, R. H., Wheland, R. H., Zhang, X. H., & Gordan, J. H.(2002).Behavior of candidate organic pellicle materials under 157-nm laser irradiation.Proceedings of SPIE.
French, R. H., Wheland, R. H., Qiu, W. H., Lemon, M. H., Blackman, G. H., Zhang, X. H., Gordon, J. H., Liberman, V. H., Grenville, A. H., Kunz, R. H., & Rothschild, M. H.(2002).157-nm pellicles: polymer design for transparency and lifetime.Proceedings of SPIE.
French, R. H., Gordon, J. H., Jones, D. H., Wheland, R. H., Zhang, X. H., Zumsteg, F. H., Sharp, K. H., & Qiu, W. H.(2001).Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography.Proc. SPIE 4346.
French, R. H., Wheland, R. H., Jones, D. H., Hilfiker, J. H., Synowicki, R. H., Zumsteg, F. H., Feldman, J. H., & Feiring, A. H.(2000).Fluoropolymers for 157-nm lithography: optical properties from {VUV} absorbance and ellipsometry measurements.Proceedings of SPIE Vol. 4000,4000
