1997,"Attenuating Embedded Phase Shift Photomask Blanks"5,897,976,Roger French, & Peter Francis Carcia.
1997,"Attenuating embedded phase shift photomask blanks "5,897,977,Roger French, & Peter Francis Carcia.
Publications
French, R. H., Francis Carcia, P. H., Hughes, G. H., Torardi, C. H., Reynolds, G. H., & Dieu, L. H.(1999).Thin Films for Phase-shift Masks.Vaccum and Thin Film.
French, R. H., Francis Carcia, P. H., Reynolds, G. H., Hughes, G. H., Torardi, C. H., Jones, D. H., & Dieu, L. H.(1999).Optical superlattices as phase-shift masks for microlithography.Proceedings of SPIE,3790
French, R. H., Reynolds, G. H., Francis Carcia, P. H., Torardi, C. H., Hughes, G. H., & Jones, D. H.(1998).{TiSi-nitride} attenuating phase-shift photomask for 193 nm lithography.SPIE,3546
French, R. H., Francis Carcia, P. H., & Jones, D. H.(1997).Optical superlattices—a strategy for designing phase-shift masks for photolithography at 248 and 193 nm: Application to {AlN/CrN}.Applied Physics Letters,70(18),2371-2373.
