Lee, K., Jockusch, S., Turro, N., French, R. H., Wheland, R. H., Lemon, M. H., Braun, A. H., Widerschpan, T. H., & Zimmerman, P. H.(2004).157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons.Proceedings of SPIE.
