French, R. H., Qiu, W. H., Yang, S. H., Wheland, R. H., Lemon, M. H., Shoe, A. H., Adelman, D. H., Crawford, M. H., Tran, H. H., Feldman, J. H., McLain, S. H., & Peng, S. H.(2006).Second generation fluids for 193nm immersion lithography..
French, R. H., Sewell, H. H., Yang, S. H., Peng, S. H., McCafferty, D. H., Qiu, W. H., Wheland, R. H., Lemon, M. H., Markoya, L. H., & Crawford, M. H.(2005).Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k[sub 1] of 0.25.Journal of Microlithography, Microfabrication, and Microsystems,4, 031103.
Peng, S., French, R. H., Qiu, W. H., Wheland, R. H., Yang, S. H., Lemon, M. H., & Crawford, M. H.(2005).Second generation fluids for 193 nm immersion lithography.Proceedings of SPIE.
Tan, G., Lemon, M., & French, R. H.(2004).Optical Properties and London Dispersion Forces of Amorphous Silica Determined by Vacuum Ultraviolet Spectroscopy and Spectroscopic Ellipsometry.Journal of the American Ceramic Society,86, 1885–1892.
Lee, K., Jockusch, S., Turro, N., French, R. H., Wheland, R. H., Lemon, M. H., Braun, A. H., Widerschpan, T. H., & Zimmerman, P. H.(2004).157-nm pellicles for photolithography: mechanistic investigation of the {deep-UV} photolysis of fluorocarbons.Proceedings of SPIE.
French, R. H., Yang, S. H., Lemon, M. H., Synowicki, R. H., Pribil, G. H., Cooney, G. H., Herzinger, C. H., Green, S. H., Burnett, J. H., & Kaplan, S. H.(2004).Immersion fluid refractive indices using prism minimum deviation techniques.Proceedings of SPIE.
French, R. H., Wheland, R. H., Qiu, W. H., Lemon, M. H., Blackman, G. H., Zhang, X. H., Gordon, J. H., Liberman, V. H., Grenville, A. H., Kunz, R. H., & Rothschild, M. H.(2002).157-nm pellicles: polymer design for transparency and lifetime.Proceedings of SPIE.
