French, R. H., Liberman, V. H., Tran, H. H., Feldman, J. H., Adelman, D. H., Wheland, R. H., Qiu, W. H., McLain, S. H., Kaku, M. H., Mocella, M. H., Nagao, K. H., & Person, N. H.(2007).High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches..
