French, R. H., Gordon, J. H., Jones, D. H., Wheland, R. H., Zhang, X. H., Zumsteg, F. H., Sharp, K. H., & Qiu, W. H.(2001).Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography.Proc. SPIE 4346.
French, R. H., Wheland, R. H., Gordon, J. H., & Zhang, W. H.(2001).Optimizing polymers to increase pellicle lifetime and transmission for 157-nm lithography.Micro.
