French, R., Tran, H., Adelman, D., Rogado, ., Kaku, M., Mocella, M., Chen, C., Hendrickx, E., Van Roey, F., Bernfeld, A., & Derryberry, R.().High-index immersion fluids enabling cost-effective single-exposure lithography for 32 nm half pitches..
French, R. H., Liberman, V. H., Tran, H. H., Feldman, J. H., Adelman, D. H., Wheland, R. H., Qiu, W. H., McLain, S. H., Kaku, M. H., Mocella, M. H., Nagao, K. H., & Person, N. H.(2007).High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches..
