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Tran, H., French, R., Adelman, D., Feldman, J., Qiu, W., Wheland, R., Brubaker, L., Fischel, B., Fones, B., Lemon, M., Yang, M., Nagao, O., Kaku, M., Mocella, M., & Schmieg, J.().Evaluation of Next Generation Fluids for {ArF} Immersion Lithography Beyond Water.Journal of Photopolymer Science and Technology,20, 729–738.
Feiring, A., Crawford, M., Farnham, W., Feldman, J., French, R. H., Junk, C. H., Leffew, K. H., Petrov, V. H., Qiu, W. H., Schadt, F. H., Tran, H. H., & Zumsteg, F. H.(2006).New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and {Non-Fluorinated} Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm.Macromolecules,39, 3252–3261.
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